Gates technology based high-k and ALD/CVD metal precursor market, which was estimated at over USD 33 million in 2015, is forecast to grow considerably over the next few years, owing to high requirement for thermal and chemical stability.
— As per Global Market Insights, Inc., research study “High-k and ALD/CVD metal precursor market size is forecast to hit USD 965 million by 2024.” Today, industry players are laying more emphasis on developing processes to form hybrid thin inorganic-organic films with the desired features to reduce production costs, thereby stimulating the demand for high-k and ALD/CVD metal precursors. High popularity of trailing edge devices supporting internet of things (IoT) technology and consumer electronics sector growth, is expected to fuel the industry trends over the coming seven years.
Governments across the globe have made heavy investments in nanotechnology research, owing to its growing application across industrial and military sectors, and this is predicted to generate high avenues for high-k and CVD metal precursor industry over the coming timeframe. For instance, EU, U.S., and Japan have made investments of USD 1.2 billion, USD 3.7 billion, and USD 750 million respectively in the national nanotechnology initiative.
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Processes to develop thin film with the required properties for numerous applications has pushed notable companies to offer cost-effective and differentiated solutions. New compressed devices offer high aspect ratios and thin film formation by ALD or CVD.
Low thermal stability of metal-organic compounds has lent an edge as molecular precursors. Sputtering techniques and other methods are used to deposit Phase Change Materials (PCM) which are weak regarding the uniformity of deposition. Thus, substitute methods provide benefits such as compositional control and industrial scaling, which in turn drives the high-k and ALD/CVD metal precursor market demand.
Various technologies such as gates, capacitor, and interconnect are expected to influence high-k and ALD/CVD metal precursor industry growth over the coming seven years. Interconnect technology, which had a considerable impact on the global high-k and ALD/CVD metal precursor industry share in 2015, is expected to witness a significant growth over the period of 2016-2024. Gates technology based high-k and ALD/CVD metal precursor market, which was estimated at over USD 33 million in 2015, is forecast to grow considerably over the next few years, owing to high requirement for thermal and chemical stability.
Several manufacturers are now shifting their focus towards chemical, dielectric and optical properties of hybrid inorganic-organic films in order to minimize manufacturing costs. Increasing intellectual property rights (IPR) protection laws will play a key role in IPR filings on chemical designs and precursor material composition. Strategic alliances along the high-k and ALD/CVD metal precursor market value chain are required to effectively provide chemicals for the equipment in terms of new molecules and hardware. Cost-effective and seamless fabrication of semiconductor devices for complicated 3D architectures have widened the scope for extensive R&D to develop high-quality sophisticated precursors in cylinders. Government initiatives and regulations regarding semiconductor device manufacturing will provide a boost to the high-k and ALD/CVD metal precursor market share over the forecast timeframe.
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North America high-k and ALD/CVD metal precursor industry revenue is expected to witness a high surge over the period of 2016-2024, driven by growing nanotechnology and microelectronics sector. U.S. is projected to contribute significantly towards the regional revenue.
Asia Pacific was the leading regional industry, with China accounting for over 35% of the high-k and ALD/CVD metal precursor market share. Growing semiconductor demand from BRIC countries due to rising consumption of consumer electronics and durables coupled with factors like low cost, portability will drive the regional demand.
High-k and ALD/CVD metal precursor market participants include Dow Chemical, ATMI, Air Liquide, Air Products and Chemicals, Adeka, UP Chem. Major trends followed by companies include mergers and acquisitions, strategic joint ventures and technological innovations. For instance, UP Chem and Chemtura Corp collaborated to form a joint venture for manufacturing of high quality pure MO precursors to cater to the demand in Asia Pacific.
Some Point from Table of Contents:
Chapter 3. High-k and ALD/CVD Metal Precursor Market Insights
3.1. Industry segmentation
3.2. Industry Size and forecast, 2013 - 2024
3.3. Industry ecosystem analysis
3.3.1. Precursors market trends
3.4 Technological & innovation landscape
3.5 Industry Impact forces
3.5.1 Growth drivers
18.104.22.168 Rising demand for sophisticated products
22.214.171.124 Superior customer service
3.5.2 Industry pitfalls & challenges
126.96.36.199 High auxiliary expenses
3.6. Growth potential analysis
3.7. Porter’s analysis
3.8. Competitive landscape, 2015
3.8.1. Strategy dashboard
3.9. PESTEL analysis
Chapter 4 High-k and ALD/CVD Metal Precursor Technology Insights
4.1 High-k and ALD/CVD metal precursor market share by technology, 2015 & 2024
4.2.1 Market estimates by region, 2013 - 2024
4.3.1 Market estimates by region, 2013 - 2024
4.4.1 Market estimates by region, 2013 - 2024
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